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Category:Fine Chemicals > Other Fine Chemicals
Product Name:Oxygen
CAS No.:7782-44-7
Standard:In-house Standards
Price(USD):Negotiable
Company:Shanghai Wechem Technology Limited
Grade: Pharmaceutical Grade
Factory Location: Building A311, Building A, No. 1255 Jinhai Road, Pudong New Area, Shanghai (Dingxin Building)
Main Sales Markets: North America,Central/South America,Western Europe,Eastern Europe,Australasia,Asia,Middle East,Africa
Sample Provided: no
Payment Terms: L/L
Specification
Purity,% 99.995 99.999 99.9997
Argon
≤1.0 ppmv
Nitrogen ≤25.0 ppmv ≤5.0 ppmv ≤1.0 ppmv
Carbon dioxide ≤0.5 ppmv ≤0.1 ppmv ≤0.1 ppmv
Carbon monoxide ≤0.5 ppmv ≤0.1 ppmv ≤0.1 ppmv
Total hydrocarbon (CH4) ≤0.5 ppmv ≤0.1 ppmv ≤0.1 ppmv
Moisture ≤2.0 ppmv ≤0.5 ppmv ≤0.1 ppmv
Argon ≤3.0 ppmv ≤3.0 ppmv
Hydrogen ≤1.0 ppmv ≤0.1 ppmv ≤0.1 ppmv
transportation
DOT shipping name Oxygen, compressed
DOT classification 2.2
DOT label Non-flammable gas
UN NO. UN 1072
CAS No. 7782-44-7
CGA/DISS/JIS/BS341/DIN477 540/714/W22-14R/NO.3/NO.9
Transport state Compressible gas
Technical Information
Cylinder condition @ 21.1°C gas
The combustion limit in the air is not combustible
Natural temperature (°C)-
Molecular weight (g/mol) 31.999
Specific gravity (air =1) 1.105
Critical temperature (°C) -118.57
Critical temperature (psig) 714.4
Application
1. It is the component of standard gas.
2. Emergency treatment in emergencies such as suffocation and heart disease.
3. In the treatment of patients with respiratory diseases.
4. Anesthesia.
5. Research in chemical oxidation reactions.
6. In semiconductor manufacturing, chemical vapor deposition of silicon dioxide.
7. In semiconductor manufacturing, thermal oxidation growth.
8. In semiconductor manufacturing, plasma etching.
9. In semiconductor manufacturing, plasma stripping of photoresist.
10. In semiconductor manufacturing, certain deposition/diffusion operations in carrier gas.
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