Basic Info
  • Grade: Pharmaceutical Grade

    Factory Location: 1885 City Road, Minhang District, Shanghai

    Main Sales Markets: North America,Central/South America,Western Europe,Eastern Europe,Australasia,Asia,Middle East,Africa

  • Sample Provided: no

    Payment Terms: L/L

    Specification    

    Purity,% 99.999 99.9999
    Oxygen ≤1.0 ppmv ≤ 40 ppbv
    Nitrogen ≤2.0 ppmv ≤ 250 ppbv
    Carbon dioxide ≤ 0.5ppmv ≤ 40 ppbv
    Carbon monoxide ≤ 0.1ppmv ≤ 10ppbv
    Moisture ≤ 0.5 ppmv ≤ 350 ppbv
    C1-C2 ≤ 2.0 ppmv ≤ 500 ppbv
    Germane
    ≤ 50 ppbv
    Hydrogen sulfide
    ≤ 50 ppbv

    transportation    

    DOT Shipping name Arsine
    DOT classification 2.3 (2.1) Toxic gas
    DOT label Toxic gas/respiratory hazard, flammable gas
    UN NO. UN 2188
    CAS No. 7784-42-1
    CGA/DISS/JIS 350/632/W22-14L
    Transportation status Liquefied gas

    Technical Information    

    Cylinder condition @ 21.1°C liquid
    Combustion limit in air 5.1-78%
    Natural temperature (°C)-
    Molecular weight (g/mol) 77.95
    Specific gravity (air =1) 2.695
    Critical temperature (°C) 99.85
    Critical temperature (psig) 985.3

    Application

    1. In semiconductor manufacturing, arsine is an n-type dopant for epitaxial silicon (usually mixed with hydrogen).
    2. For the doped selected area of ​​the silicon wafer, use deposition/diffusion technology to form shallow structures, such as emitters or source-drain contacts (usually ppm to percentage levels, nitrogen is the balance gas).
    3. Using ion implantation, doping in selected areas (usually mixed with hydrogen).
    4. Participate in many chemical reactions.

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