1,3-Hexafluorobutadiene-(C4F6)

Name: 1,3-Hexafluorobutadiene-(C4F6)
Availability: 1-3-hexafluorobutadiene-c4f6-273881.html

Category:Fine Chemicals > Other Fine Chemicals
Product Name:1,3-Hexafluorobutadiene-(C4F6)
CAS No.:685-63-21
Standard:In-house Standards
Price(USD):Negotiable
Company:Shanghai Wechem Technology Limited

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Basic Info

Grade: Pharmaceutical Grade

Factory Location: Building A311, Building A, No. 1255 Jinhai Road, Pudong New Area, Shanghai (Dingxin Building)

Main Sales Markets: North America,Central/South America,Western Europe,Eastern Europe,Australasia,Asia,Middle East,Africa
Sample Provided: no

Payment Terms: L/L

Specifications
Purity , %	99.9
Argon+Oxygen	≤10 ppmv
Nitrogen	≤40 ppmv
Carbon Dioxide	≤20 ppmv
Carbon Monoxide	≤7 ppmv
Other Halocarbons	≤700 ppmv
Hydrogen Fluoride	≤10 ppmv

Ship
DOT Shipping Name	Liquefied gas, toxic, flammable,n.o.s.(HEXAFLUORO-1,3- BUTADIENE)
DOT Classification	2.1 , 2.3
DOT Label	Liquefied gas, toxic, flammable
UN Number	UN 3160
CAS No.	685-63-21
CGA/DISS	638
Shipped as	Liquefied gas

Technical Information
Cylinder State @ 21.1°C	Liquid
Flammable Limits In Air
Auto Ignition Temperature (°C )
Molecular Weight (g/mol)	162.03
Specific gravity (air =1)
Critical Temperature ( °C )	139.6
Critical Pressure ( psig )

Applications
This is a next gereration core material required to minimize circuit line widths and depths in LSI production processes . This dry etching gas is used to micro contact hole etching processes . For any specialty gas based on a CxFy Formula , the less the fraction F/C becomes, the more CF2 radicals are generated . As the fraction is lower for C4F6 than for C2F6 and C3F8 , more CF2 radicals are generated , which , in turn, etches oxide films . Therefore , C4F6 has a higher selectivity for oxide films and allows for more even etching .

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